High-sensitivity silicide films for optical recording.
Autor: | Ahn, K. Y., DiStefano, T. H., Herd, S. R., Mazzeo, N. J., Tu, K. N. |
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Zdroj: | Journal of Applied Physics; Sep1982, Vol. 53 Issue 9, p6360-6364, 5p |
Databáze: | Complementary Index |
Externí odkaz: |