Oxide charges induced in thermal silicon dioxide by scanning electron and laser beam annealing.
| Autor: | Razouk, R. R., Delfino, M., Fulks, R. T., Powell, R. A., Yep, T. O. |
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| Zdroj: | Journal of Applied Physics; Jan1982, Vol. 53 Issue 1, p800-803, 4p |
| Databáze: | Complementary Index |
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