Annealing of phosphorus implanted silicon wafers by multiscanning electron beam: Solar cells application.
| Autor: | Bentini, G. G., Galloni, R., Gabilli, E., Nipoti, R., Olzi, E., Servidori, M., Turisini, G., Zignani, F. |
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| Zdroj: | Journal of Applied Physics; Nov1981, Vol. 52 Issue 11, p6735-6742, 8p |
| Databáze: | Complementary Index |
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