The effect of phosphorus ion implantation on molybdenum/silicon contacts.
| Autor: | Chiang, S. W., Chow, T. P., Reihl, R. F., Wang, K. L. |
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| Zdroj: | Journal of Applied Physics; Jun1981, Vol. 52 Issue 6, p4027-4032, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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