Correlation of chemical and electrical properties of plasma-deposited tetramethylsilane films.
| Autor: | Szeto, R., Hess, D. W. |
|---|---|
| Zdroj: | Journal of Applied Physics; Feb1981, Vol. 52 Issue 2, p903-908, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Szeto, R., Hess, D. W. |
|---|---|
| Zdroj: | Journal of Applied Physics; Feb1981, Vol. 52 Issue 2, p903-908, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|