cw laser annealing of hydrogenated amorphous silicon obtained by rf sputtering.
| Autor: | Thomas, J.P., Fallavier, M., Affolter, K., Lüthy, W., Dupuy, M. |
|---|---|
| Zdroj: | Journal of Applied Physics; Jan1981, Vol. 52 Issue 1, p476-479, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|