The ''inhibition effect'' of a trichloroethane oxidation to suppress the stacking-fault nucleation in silicon.
| Autor: | Claeys, C. L., Declerck, G. J., Van Overstraeten, R. J. |
|---|---|
| Zdroj: | Journal of Applied Physics; Dec1980, Vol. 51 Issue 12, p6183-6188, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|