Electron transport across aluminum/ultrathin silicon oxide/phosphorus implanted silicon barriers.
| Autor: | Kikuchi, Akira, Yamamoto, Hiroshi, Iwata, Seiichi, Ikeda, Takahide, Nakata, Kensuke |
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| Zdroj: | Journal of Applied Physics; Sep1980, Vol. 51 Issue 9, p4913-4918, 6p |
| Databáze: | Complementary Index |
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