Silicide formation by high-dose Si+-ion implantation of Pd.
| Autor: | Chapman, G. E., Lau, S. S., Matteson, S., Mayer, J. W. |
|---|---|
| Zdroj: | Journal of Applied Physics; Oct1979, Vol. 50 Issue 10, p6321-6327, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Chapman, G. E., Lau, S. S., Matteson, S., Mayer, J. W. |
|---|---|
| Zdroj: | Journal of Applied Physics; Oct1979, Vol. 50 Issue 10, p6321-6327, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|