Fundamental aspects of electron beam lithography. II. Low-voltage exposure of negative resists.
| Autor: | Thompson, L. F., Feit, E. D., Melliar-Smith, C. M., Heidenreich, R. D. |
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| Zdroj: | Journal of Applied Physics; Sep1973, Vol. 44 Issue 9, p4048-4051, 4p |
| Databáze: | Complementary Index |
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