Resonance ionization mass spectrometry-applications to surface analyses and depth profiles of semiconductors.
| Autor: | Whitaker, T. J., Willey, K. F., Garrett, W. R., Arlinghaus, H. F. |
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| Zdroj: | AIP Conference Proceedings; Nov1998, Vol. 449 Issue 1, p786-789, 4p |
| Databáze: | Complementary Index |
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