Surface chemical reactivity of plasma-deposited amorphous silicon.
Autor: | Aspnes, D. E., Bagley, B. G., Studna, A. A., Adams, A. C., Alexander, F. B. |
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Zdroj: | AIP Conference Proceedings; Jun1981, Vol. 73 Issue 1, p307-311, 5p |
Databáze: | Complementary Index |
Externí odkaz: |