| Abstrakt: |
A new sputtering chamber for atomic absorption measurements was designed to have maximum ground state atoms in view and minimum emission, what is really the reverse situation compared to the known glow discharge configuration. Therefore, gas (Ar) is introduced directly at the sample surface drawing the plume of gas and atoms directly out, vertically from the sample surface. By using angled gas jets of high velocity flows compared to the atomic diffusion rate the amount of material atomized becomes increased and the sputtered material is directed away from the sample surface. The loss of atoms due to deposition on the sample and walls of the sputter chamber is minimized by its configuration. The deep penetration of the sample results in a more representative analysis by presenting more of the sample for measurement. In addition sensitivity is increased. The appealing goals to be reached by this technique include: The first results obtained in a routine laboratory are presented here. [ABSTRACT FROM AUTHOR] |
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