Comparison of the long time stability of some SiCO: H films and related compounds with respect to postdeposition incorporation of OH groups.
Autor: | Bartella, J., Herwig, U. |
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Zdroj: | Fresenius' Journal of Analytical Chemistry; 1993, Vol. 346 Issue 1-3, p351-354, 4p |
Databáze: | Complementary Index |
Externí odkaz: |