Primary oxygen ion implantation effects on depth profiles by secondary ion emission mass spectrometry.
| Autor: | Lewis, R. K., Morabito, J. M., Tsai, J. C. C. |
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| Zdroj: | Applied Physics Letters; Sep1973, Vol. 23 Issue 5, p260-262, 3p |
| Databáze: | Complementary Index |
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