Electrical properties and ion implantation of epitaxial GaN, grown by low pressure metalorganic chemical vapor deposition.
Autor: | Khan, M. A., Skogman, R. A., Schulze, R. G., Gershenzon, M. |
---|---|
Zdroj: | Applied Physics Letters; 1983, Vol. 42 Issue 5, p430-432, 3p |
Databáze: | Complementary Index |
Externí odkaz: |