Electrical properties and ion implantation of epitaxial GaN, grown by low pressure metalorganic chemical vapor deposition.

Autor: Khan, M. A., Skogman, R. A., Schulze, R. G., Gershenzon, M.
Zdroj: Applied Physics Letters; 1983, Vol. 42 Issue 5, p430-432, 3p
Databáze: Complementary Index