| Autor: |
Suhr, H., Etspüler, A., Feurer, E., Kraus, S. |
| Zdroj: |
Plasma Chemistry & Plasma Processing; Jun1989, Vol. 9 Issue 2, p217-223, 7p |
| Abstrakt: |
Three different techniques for the deposition of thin metal alloy films by plasma-enhanced chemical vapor deposition are described. These are the joint vaporization of a mixture of precursors, the use of separate sources connected directly to the reactor, and finally, the use of several reservoirs arranged in series. Various organometallics have been used as precursors to prepare combinations of Fe/Co and Au/Pt/Pd. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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