| Autor: |
Bartella, J., Grünwald, H., Herwig, U. |
| Zdroj: |
Microchimica Acta; 1987, Vol. 91 Issue 1-6, p365-369, 5p |
| Abstrakt: |
Commercially available float-glass samples were exposed to ion bombardment in an HF-plasma. This should form an SiO-rich layer close to the surface of the samples. From XPS-investigations it was found that treatment times between 2 and 4 min in Ar plasma lead to a pronounced depletion of alkalis. Further FAB-SIMS depth profiles gave additional information about the extension of the layers with altered stoichiometry. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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