| Autor: |
Hatada, Koichi, Kitayama, Tatsuki, Danjo, Shigeru, Yuki, Heimei, Aritome, Hiroaki, Namba, Susumu, Nate, Kazuo, Yokono, Hitoshi |
| Zdroj: |
Polymer Bulletin; 1982, Vol. 8 Issue 9/10, p469-472, 4p |
| Abstrakt: |
The copolymers of aliphatic aldehydes were prepared in toluene with diethylaluminum diphenylamide at −78°C. It was found that the copolymer was depolymerized into monomeric aldehydes on the exposure to electron-beam or X-ray. When the copolymer was used as an electron-beam resist, almost complete development was accomplished by exposure alone. No development step was required. The sensitivities of poly(ethanal-co-propanal), poly(ethanal-co-butanal), poly(ethanal-co-heptanal) and poly(ethanal-co-3-phenylpropanal) at the film thickness of 0.4∼0.7 μm were 8×10, 7×10, 1.7×10 and 6.5× 10 c/cm, respectively. The copolymer acts also as an X-ray resist of high sensitivity. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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