Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance in the presence of particles for EUV lithography.
| Autor: | Sogard, Michael R., Mikkelson, Andrew R., Ramaswamy, Vasu, Engelstad, Roxann L. |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72710H-72710H-14, 14p |
| Databáze: | Complementary Index |
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