Exposure tool settings and OPC strategies for EUV lithography at the 16-nm node.
| Autor: | Deng, Yunfei, Kye, Jongwook, La Fontaine, Bruno, Wallow, Tom, Wood, Obert, Levinson, Harry, Fumar-Pici, Anita, Mizuno, Hiroyuki, Koay, Chiew-seng, McIntyre, Greg |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727119-727119-10, 10p |
| Databáze: | Complementary Index |
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