Characterization of a 0.25NA full-field EUV exposure tool.
| Autor: | Kritsun, Oleg, La Fontaine, Bruno, Hao, Yudong, Li, Jie, Wood, Obert, Raghunathan, Sudharshanan, Brunner, Tim, Koay, Chiew-Seng, Mizuno, Hiroyuki |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727121-727121-11, 11p |
| Databáze: | Complementary Index |
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