Diffraction-based overlay metrology for double patterning technologies.

Autor: Dasari, Prasad, Korlahalli, Rahul, Li, Jie, Smith, Nigel, Kritsun, Oleg, Volkman, Cathy
Zdroj: Proceedings of SPIE; Nov2009, Issue 1, p727212-727212-12, 12p
Databáze: Complementary Index