Diffraction-based overlay metrology for double patterning technologies.
Autor: | Dasari, Prasad, Korlahalli, Rahul, Li, Jie, Smith, Nigel, Kritsun, Oleg, Volkman, Cathy |
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Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727212-727212-12, 12p |
Databáze: | Complementary Index |
Externí odkaz: |