Intrafield process control for 45 nm CMOS logic patterning.
| Autor: | Le Gratiet, Bertrand, Massin, Jean, Ostrovski, Alain, Monget, Cedric, Decaux, Marianne, Thivolle, Nicolas, Faure, Romuald, Baron, Fabrice, Chapon, Jean-Damien, Dabertrand, Karen, Sundermann, Frank, Gouraud, Pascal, Babaud, Laurène, Thevenon, Lionel, Cluet, Nicolas, VandeWalle, Boris |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72722P-72722P-10, 10p |
| Databáze: | Complementary Index |
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