Materials for single-etch double patterning process: surface curing agent and thermal cure resist.
| Autor: | Bae, Young C., Liu, Yi, Cardolaccia, Thomas, McDermott, John C., Trefonas, Peter, Spizuoco, Ken, Reilly, Michael, Pikon, Amandine, Joesten, Lori, Zhang, Gary G., Barclay, George G., Simon, Julia, Gaurigan, Stéphanie |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727306-727306-12, 12p |
| Databáze: | Complementary Index |
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