Investigation of the foot-exposure impact in hyper-NA immersion lithography when using thin anti-reflective coating.
Autor: | Jurajda, Darron, Tenaglia, Enrico, Jeauneau, Jonathan, De Simone, Danilo, Zhu, Zhimin, Piazza, Paolo, Piacentini, Paolo, Canestrari, Paolo |
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Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72730Z-72730Z-10, 10p |
Databáze: | Complementary Index |
Externí odkaz: |