Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning.
| Autor: | Wong, Sabrina, Yu, Jeong Yun, Kim, Sue Ryeon, Mori, Mike, Kwok, Amy, O'Connell, Kathleen M., Barclay, George, Lee, Ki Lyoung, Lee, Sung Koo, Bok, Cheol Kyu |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727318-727318-8, 8p |
| Databáze: | Complementary Index |
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