Optical threshold layer and intermediate state two-photon PAG approaches to double exposure lithography.
| Autor: | Berro, Adam J., Gu, Xinyu, O'Connor, Naphtali, Jockusch, Steffen, Nagai, Tomoki, Ogata, Toshiyuki, Zimmerman, Paul, Rice, Bryan J., Adolph, Elizabeth, Byargeon, Travis, Gonzalez, Jose, Turro, Nicholas J., Willson, C. Grant |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72731B-72731B-10, 10p |
| Databáze: | Complementary Index |
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