Molecular resists based on calix[4]resorcinarene derivatives for EB lithography.
| Autor: | Okuyama, Kenichi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72732U-72732U-7, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Okuyama, Kenichi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72732U-72732U-7, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|