Feasibility study of non-topcoat resist for 22nm node devices.
| Autor: | Sho, Koutaro, Kato, Hirokazu, Kobayashi, Katsutoshi, Iida, Kazunori, Ori, Tomoya, Muto, Daizo, Azuma, Tsukasa, Ito, Shinichi, Fujiwara, Tomoharu, Ishii, Yuuki, Nishimura, Yukio, Kawakami, Takanori, Shima, Motoyuki |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72733B-72733B-8, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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