Benefits and trade-offs of global source optimization in optical lithography.
| Autor: | Tian, Kehan, Krasnoperova, Azalia, Melville, David, Rosenbluth, Alan E., Gil, Dario, Tirapu-Azpiroz, Jaione, Lai, Kafai, Bagheri, Saeed, Chen, Chia-chen, Morgenfeld, Bradley |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72740C-72740C-12, 12p |
| Databáze: | Complementary Index |
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