Demonstration of 32nm half-pitch electrical testable NAND FLASH patterns using self-aligned double patterning.
| Autor: | Sun, Shiyu, Bencher, Chris, Chen, Yongmei, Dai, Huixiong, Cai, Man-Ping, Jin, Jaklyn, Blanco, Pokhui, Miao, Liyan, Xu, Ping, Xu, Xumou, Yu, James, Hung, Raymond, Oemardani, Shiany, Chan, Osbert, Chang, Chorng-Ping, Ngai, Chris |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72740D-72740D-7, 7p |
| Databáze: | Complementary Index |
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