Impact of CD and overlay errors on double-patterning processes.

Autor: Lapeyre, Céline, Barnola, Sébastien, Servin, Isabelle, Gaugirana, Stéphanie, Salvetat, Vincent, Magome, Nobutaka, Hazelton, Andrew J., McCallum, Martin
Zdroj: Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72740W-72740W-12, 12p
Databáze: Complementary Index