Impact of CD and overlay errors on double-patterning processes.
Autor: | Lapeyre, Céline, Barnola, Sébastien, Servin, Isabelle, Gaugirana, Stéphanie, Salvetat, Vincent, Magome, Nobutaka, Hazelton, Andrew J., McCallum, Martin |
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Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72740W-72740W-12, 12p |
Databáze: | Complementary Index |
Externí odkaz: |