Extending single-exposure patterning towards 38-nm half-pitch using 1.35 NA immersion.
| Autor: | Bouchoms, Igor, Engelen, Andre, Mulkens, Jan, Boom, Herman, Moerman, Richard, Liebregts, Paul, de Graaf, Roelof, van Veen, Marieke, Thomassen, Patrick, Emer, Wolfgang, Sperling, Frank |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72741K-72741K-10, 10p |
| Databáze: | Complementary Index |
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