Integration of dry etching steps for double patterning and spacer patterning processes.
| Autor: | Barnola, S., Lapeyre, C., Servin, I., Arvet, C., Maury, P., Mage, L. |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72741X-72741X-10, 10p |
| Databáze: | Complementary Index |
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