High index 193 nm immersion lithography: the beginning or the end of the road.
| Autor: | Zimmerman, Paul A., Rice, Bryan J., Piscani, Emil C., Liberman, Vladimir |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p727420-727420-11, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|