Si-mold fabrication for patterned media using high-resolution chemically amplified resist.
| Autor: | Fukuda, Masaharu, Chiba, Tsuyoshi, Ishikawa, Mikio, Itoh, Kimio, Kurihara, Masaaki, Hoga, Morihisa |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p73790L-73790L-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|