Trade-off between inverse lithography mask complexity and lithographic performance.
| Autor: | Kim, Byung-Gook, Suh, Sung Soo, Kim, Byung-Sung, Woo, Sang-Gyun, Cho, Han-Ku, Tolani, Vikram, Dai, Grace, Irby, Dave, Wang, Kechang, Xiao, Guangming, Kim, David, Baik, Ki-Ho, Gleason, Bob |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p73791M-73791M-11, 11p |
| Databáze: | Complementary Index |
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