Study of CD variation at EUV mask fabrication occurred by electric conduction from top to back side.
| Autor: | Takai, Kosuke, Murano, Koji, Hagihara, Kazuki, Itoh, Masamitsu, Abe, Tsukasa, Adachi, Takashi, Akizuki, Hideo, Takikawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p73792I-73792I-8, 8p |
| Databáze: | Complementary Index |
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