Evaluation of EUVL mask pattern defect inspection using 199nm inspection tool with super-resolution method.
| Autor: | Shigemura, Hiroyuki, Amano, Tsuyoshi, Nishiyama, Yasushi, Suga, Osamu, Arisawa, Yukiyasu, Hashimoto, Hideaki, Takahara, Kenichi, Usuda, Kinya, Kikuiri, Nobutaka, Hirano, Ryoichi |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p73792K-73792K-10, 10p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|