Measurement sampling frequency impact on determining magnitude of pattern placement errors on photomasks.
| Autor: | Whittey, J., Laske, F., Roeth, K.-D., McCormack, J., Adam, D., Bender, J., Berglund, C. N., Takac, M., Chou, Seurien |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p74881I-74881I-9, 9p |
| Databáze: | Complementary Index |
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