Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address double patterning lithography challenges.
| Autor: | Roeth, Klaus-Dieter, Laske, Frank, Heiden, Michael, Adam, Dieter, Parisoli, Lidia, Czerkas, Slawomir, Whittey, John, Schmidt, Karl-Heinrich |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p74881M-74881M-8, 8p |
| Databáze: | Complementary Index |
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