Isotropic treatment of EMF effects in advanced photomasks.

Autor: Tirapu Azpiroz, Jaione, Rosenbluth, Alan E., Graur, Ioana, Burr, Geoffrey W., Villares, Gustavo
Zdroj: Proceedings of SPIE; Nov2009 Part 3, Issue 1, p74882D-74882D-20, 20p
Databáze: Complementary Index