EUV mask pattern inspection with an advanced electron beam inspection system.
| Autor: | Shimomura, Takeya, Inazuki, Yuichi, Tsukasa, Abe, Takikawa, Tadahiko, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Wang, Fei, Ma, Long, Zhao, Yan, Kuan, Chiyan, Xiao, Hong, Jau, Jack |
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| Zdroj: | Proceedings of SPIE; Nov2009 Part 3, Issue 1, p75201D-75201D-8, 8p |
| Databáze: | Complementary Index |
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