Improving 1D optical proximity effect matching for 45-nm node by scatterometry metrology.
| Autor: | Chang, Dennis, Jungblut, Reiner, Shieh, Jason, Chen, Alek, Hinnen, Paul, Megens, Henry, Schreel, Koen |
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| Zdroj: | Proceedings of SPIE; Nov2009, Issue 1, p752036-752036-8, 8p |
| Databáze: | Complementary Index |
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