Lithographic performance of an ASML i-line step-and-repeat system by using photosensitive Durimides.
| Autor: | Pellens, Rudy J. M., van Klaveren, Angelique, Voets, Rutger, van den Heuvel, Jean-Paul, Misat, Sylvain, Waterson, Pamela J., Peterson, Laurie J. |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p122-129, 8p |
| Databáze: | Complementary Index |
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