Lithographic characterization of improved projection optics in the EUVL engineering test stand.

Autor: O'Connell, Donna J., Lee, Sang Hun, Ballard, William P., Tichenor, Daniel A., Bernardez II, Louis J., Haney, Steven J., Johnson, Terry A., Barr, Pamela K., Leung, Alvin H., Jefferson, Karen L., Replogle, William C., Goldsmith, John E. M., Chapman, Henry N., Naulleau, Patrick P., Wurm, Stefan, Panning, Eric M.
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p83-94, 12p
Databáze: Complementary Index