Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling.

Autor: Robertson, Stewart A., Naulleau, Patrick P., O'Connell, Donna J., McDonald, Kevin, Delano, Todd M., Goldberg, Kenneth A., Hansen, Steven G., Brown, Kirk W., Brainard, Robert L.
Zdroj: Proceedings of SPIE; Nov2003, Issue 1, p900-909, 10p
Databáze: Complementary Index