Calibration of EUV 2D photoresist simulation parameters for accurate predictive modeling.
Autor: | Robertson, Stewart A., Naulleau, Patrick P., O'Connell, Donna J., McDonald, Kevin, Delano, Todd M., Goldberg, Kenneth A., Hansen, Steven G., Brown, Kirk W., Brainard, Robert L. |
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Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p900-909, 10p |
Databáze: | Complementary Index |
Externí odkaz: |