Spectroscopic Ellipsometry based Scatterometry enabling 193nm Litho and Etch process control for the 110nm technology node and beyond.
| Autor: | Hingst, Thomas, Marschner, Thomas, Moert, Manfred, Homilius, Jan, Guevremont, Marco, Hopkins, John, Elazami, Assim |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p274-285, 12p |
| Databáze: | Complementary Index |
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