New criterion about the topography of W-CMP wafer's alignment mark.
| Autor: | Ina, Hideki, Matsumoto, Takahiro, Sentoku, Koichi, Matsuyama, Katsuhiro, Katagiri, Kazuhiko |
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| Zdroj: | Proceedings of SPIE; Nov2003, Issue 1, p445-452, 8p |
| Databáze: | Complementary Index |
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